High-power lasers

For high power visible or excimer applications we can provide micro-optic solutions in etched high purity fused silica with high power lasers. These glass optics have nearly the same damage threshold as bulk fused silica and have been fielded in the most demanding applications including laser fusion laboratories and high power semiconductor laser applications such as semiconductor and laser ablation systems.

Many of our engineered diffusers, microlens arrays, and phase plates are required in these applications where surface structures are directly etched into the fused silica substrate using reactive-ion etching processes. We currently have capability to etch up to 9in diameter substrates and depths exceeding 100 microns.